Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Zhaofu Zhang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Zhaofu Zhang returned 2 record(s).

NumberTitle
1650-V Double-Channel Lateral Schottky Barrier Diode With Dual-Recess Gated Anode
2Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer