Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Wen Yang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wen Yang returned 2 record(s).

NumberTitle
1Optical properties and bandgap evolution of ALD HfSiOx films
2Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application