Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Honggi Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Honggi Kim returned 1 record(s).

NumberTitle
1The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer