Bernard Pelissier Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Bernard Pelissier returned 3 record(s).

Number	Title
1	Evaluation of plasma parameters on PEALD deposited TaCN
2	Interface and plasma damage analysis of PEALD TaCN deposited on HfO₂ for advanced CMOS studied by angle resolved XPS and C-V
3	Area selective deposition of TiO₂ by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme