Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Takayama Tomomi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Takayama Tomomi returned 2 record(s).

NumberTitle
1Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
2Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes