Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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An-Shih Shih Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by An-Shih Shih returned 2 record(s).

NumberTitle
1Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
2Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium