Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Chang-Il Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chang-Il Kim returned 2 record(s).

NumberTitle
1Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
2High-density plasma etching characteristics of indium-gallium-zinc oxide thin films in CF4/Ar plasma