Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma

Type:
Journal
Info:
TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS Vol. 16, No. 6, pp. 346-350, December 25, 2015
Date:
2015-11-11
DOI:
http://dx.doi.org/10.4313/TEEM.2015.16.6.346

Author Information

Name Institution
Jong-Chang WooChung-Ang University
Young-Hee JooChung-Ang University
Chang-Il KimChung-Ang University

Films

Plasma TiO2

Hardware used: Unknown
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Si(100)

Notes

448