Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Antti Rahtu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Antti Rahtu returned 1 record(s).

NumberTitle
1Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage