Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Nathalia Peixoto Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Nathalia Peixoto returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High pulsed current density β-Ga2O3 MOSFETs verified by an analytical model corrected for interface charge