Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Andrew J. Green Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Andrew J. Green returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High pulsed current density β-Ga2O3 MOSFETs verified by an analytical model corrected for interface charge