Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Joosung Engineering Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Joosung Engineering hardware returned 1 records.

NumberTitle
1Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate