Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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SiCxNy Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiCxNy films returned 2 record(s).

NumberTitle
1SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
2Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature