About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Via sidewall insulation for through cell via contacts

Type:
Conference Proceedings
Info:
13th International Conference on Concentrator Photovoltaic Systems (CPV-13)
Date:
2017-09-06

Author Information

Name Institution
Mathieu de LafontaineUniversity of Sherbrooke
Abdelatif JaouadUniversity of Sherbrooke
Maxine DarnonUniversity of Sherbrooke
Maïté VolatierUniversity of Sherbrooke
Richard ArèsUniversity of Sherbrooke
Simon FafardUniversity of Sherbrooke
Vincent AimezUniversity of Sherbrooke

Films

Plasma SiO2

Hardware used: Unknown


Film/Plasma Properties

Substrates

InGaAs
InGaP
Ge

Notes

1148