Publication Information

Title: Liquid-phase-deposited siloxane-based capping layers for silicon solar cells

Type: Journal

Info: APPLIED PHYSICS LETTERS 106, 052104 (2015)

Date: 2015-01-23

DOI: http://dx.doi.org/10.1063/1.4907533

Author Information

Name

Institution

Boris Veith-Wolf

Institute for Solar Energy Research Hamelin (ISFH)

Jianhui Wang

Optitune International Pte. Ltd.

Milja Hannu-Kuure

Optitune International Pte. Ltd.

Ning Chen

Optitune International Pte. Ltd.

Admir Hadzic

Optitune International Pte. Ltd.

Paul Williams

Optitune International Pte. Ltd.

Jarkko Leivo

Optitune International Pte. Ltd.

Ari Karkkainen

Optitune International Pte. Ltd.

Jan Schmidt

Institute for Solar Energy Research Hamelin (ISFH)

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Silicon

Keywords

Passivation

Solar

Notes

PEALD A2O3 used for crystalline silicon solar cell passivation.

320


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2018 plasma-ald.com