Liquid-phase-deposited siloxane-based capping layers for silicon solar cells

Type:
Journal
Info:
APPLIED PHYSICS LETTERS 106, 052104 (2015)
Date:
2015-01-23
DOI:
http://dx.doi.org/10.1063/1.4907533

Author Information

Name Institution
Boris Veith-WolfInstitute for Solar Energy Research Hamelin (ISFH)
Jianhui WangOptitune International Pte. Ltd.
Milja Hannu-KuureOptitune International Pte. Ltd.
Ning ChenOptitune International Pte. Ltd.
Admir HadzicOptitune International Pte. Ltd.
Paul WilliamsOptitune International Pte. Ltd.
Jarkko LeivoOptitune International Pte. Ltd.
Ari KarkkainenOptitune International Pte. Ltd.
Jan SchmidtInstitute for Solar Energy Research Hamelin (ISFH)

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Silicon

Notes

PEALD A2O3 used for crystalline silicon solar cell passivation.
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