2021 Year in Review

The publication database currently has 1616 entries.

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202 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

250 Film and Plasma Characteristics

88 Theses

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Tailoring angular selectivity in SiO₂ slanted columnar thin films using atomic layer deposition of titanium nitride Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition

Search 1616 plasma ALD publications by:

202 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

250 Film and Plasma Characteristics

Liquid-phase-deposited siloxane-based capping layers for silicon solar cells

Type:

Journal

Info:

APPLIED PHYSICS LETTERS 106, 052104 (2015)

Date:

2015-01-23

DOI:

http://dx.doi.org/10.1063/1.4907533

Author Information

Name	Institution
Boris Veith-Wolf	Institute for Solar Energy Research Hamelin (ISFH)
Jianhui Wang	Optitune International Pte. Ltd.
Milja Hannu-Kuure	Optitune International Pte. Ltd.
Ning Chen	Optitune International Pte. Ltd.
Admir Hadzic	Optitune International Pte. Ltd.
Paul Williams	Optitune International Pte. Ltd.
Jarkko Leivo	Optitune International Pte. Ltd.
Ari Karkkainen	Optitune International Pte. Ltd.
Jan Schmidt	Institute for Solar Energy Research Hamelin (ISFH)

Films

Plasma Al₂O₃

Hardware used: Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Silicon

Keywords

Passivation
Solar

Notes

PEALD A₂O₃ used for crystalline silicon solar cell passivation.
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