Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Li-ping Feng Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Li-ping Feng returned 2 record(s).

NumberTitle
1Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization