Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Kimihiko Hosaka Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Kimihiko Hosaka returned 1 record(s).

NumberTitle
1Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium