Inductively coupled plasma sources from Plasma ALD, LLC.


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Y. G. Yang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Y. G. Yang returned 1 record(s).

NumberTitle
1Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer