Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Jae Kyoung Mun Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jae Kyoung Mun returned 1 record(s).

NumberTitle
1Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric