Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

H. Hahn Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by H. Hahn returned 1 record(s).

NumberTitle
1A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance