Inductively coupled plasma sources from Plasma ALD, LLC.


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Dongho Ryu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Dongho Ryu returned 1 record(s).

NumberTitle
1Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process