Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Fatemeh S. M. Hashemi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fatemeh S. M. Hashemi returned 1 record(s).

NumberTitle
1Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films