Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

I. Ionica Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by I. Ionica returned 1 record(s).

NumberTitle
1Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation