Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Chih-Hsiang Chang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chih-Hsiang Chang returned 1 record(s).

NumberTitle
1Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors