Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Klaus Hempel Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Klaus Hempel returned 2 record(s).

NumberTitle
1Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
2Challenges in spacer process development for leading-edge high-k metal gate technology