Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Sanghun Seo Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sanghun Seo returned 1 record(s).

NumberTitle
1Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature