Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Andrey Sergeevich Sokolov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Andrey Sergeevich Sokolov returned 1 record(s).

NumberTitle
1Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors