Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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K. Kakushima Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by K. Kakushima returned 2 record(s).

NumberTitle
1Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
2Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current