Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Miyoung Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Miyoung Kim returned 2 record(s).

NumberTitle
1Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
2Atomic structure of conducting nanofilaments in TiO2 resistive switching memory