Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Richard Meunier Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Richard Meunier returned 2 record(s).

NumberTitle
1AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
2AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD