Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Jin-Ha Shin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jin-Ha Shin returned 1 record(s).

NumberTitle
1The Properties of Cu Thin Films on Ru Depending on the ALD Temperature