Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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LiAo Cao Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by LiAo Cao returned 2 record(s).

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films