Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Chun Min Zhang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chun Min Zhang returned 2 record(s).

NumberTitle
1Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
2Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma