Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Hui Du Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hui Du returned 1 record(s).

NumberTitle
1Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films