Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Vassilios Ioannou-Sougleridis Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Vassilios Ioannou-Sougleridis returned 1 record(s).

NumberTitle
1MANOS performance dependence on ALD Al2O3 oxidation source