Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Jeffrey W. Beeman Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jeffrey W. Beeman returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes