Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Veeco NEXUS Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Veeco NEXUS hardware returned 1 records.

NumberTitle
1Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films