Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TDEAV, (Et2N)4V, [(C2H5)2N]4V, Tetrakis(DiEthylAmido) Vanadium, Vanadium Diethylamide, CAS# 219852-96-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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