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Plasma-Enhanced Atomic Layer Deposition Processed Amorphous Indium Zinc Oxide Thin-Film Transistor for Ultra-High Definition Display Application

Type:
Other
Info:
IMID 2015 Digest
Date:
2015-08-21
DOI:
http://www.imid.or.kr/m/program_detail2.asp?pre_code

Author Information

Name Institution
Jong Beom KoKorea Advanced Institute of Science and Technology
Hye In YeomKorea Advanced Institute of Science and Technology
Chi Sun HwangElectronics and Telecommunication Research Institute, (ETRI)
Sung Haeng ChoElectronics and Telecommunication Research Institute, (ETRI)
Sang-Hee Ko ParkKorea Advanced Institute of Science and Technology

Films

Plasma InZnO

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

394