About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination

Type:
Journal
Info:
Nano Energy Volume 30, December 2016, Pages 460-469
Date:
2016-10-15

Author Information

Name Institution
Francesco Di GiacomoUniversity of Rome - Tor Vergata
Valerio ZardettoEindhoven University of Technology
G. LucarelliUniversity of Rome - Tor Vergata
L. CinĂ University of Rome - Tor Vergata
Aldo Di CarloUniversity of Rome - Tor Vergata
Mariadriana CreatoreEindhoven University of Technology
Thomas M. BrownUniversity of Rome - Tor Vergata

Films

Plasma TiO2

Hardware used: Unknown


Film/Plasma Properties

Substrates

ITO

Notes

949