Your search for plasma enhanced atomic layer deposition publications authored by Dae-Young Moon returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor|
|2||Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films|
|3||Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films|
|4||Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices|
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