Your search for plasma enhanced atomic layer deposition publications authored by Yukiharu Uraoka returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition|
|2||Charge effects of ultrafine FET with nanodot type floating gate|
|3||Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant|
|4||Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing|
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