Xiao-Ying Zhang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Xiao-Ying Zhang returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
2Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
3Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
4Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD