Kurt J Lesker ALD-150L Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150L hardware returned 14 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
2Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
3Structural and optical characterization of low-temperature ALD crystalline AlN
4Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
5Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
6In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
7XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
8ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
9Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
10Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
11AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
12Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
13Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
14Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices