ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 9 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1Evaluation of plasma parameters on PEALD deposited TaCN
2Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
3Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
4Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
5PEALD ZrO2 Films Deposition on TiN and Si Substrates
6Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
7Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
8Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
9ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at:


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