Cu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Cu films returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
2Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
3Copper-ALD Seed Layer as an Enabler for Device Scaling
4Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
5Hydrogen plasma-enhanced atomic layer deposition of copper thin films
6Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
7Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
8Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
9Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
10PEALD of Copper using New Precursors for Next Generation of Interconnections
11Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
12Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD


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