Cu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Cu films returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
2Copper-ALD Seed Layer as an Enabler for Device Scaling
3Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
4Hydrogen plasma-enhanced atomic layer deposition of copper thin films
5Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
6Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
7Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
8Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
9PEALD of Copper using New Precursors for Next Generation of Interconnections
10Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
11Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com