Hafnium Tetrachloride, HfCl4, CAS# 13499-05-3

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NumberVendorLink
1EpiValenceHafnium chloride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1HfRadical Enhanced Atomic Layer Deposition of Metals and Oxides
2HfO2Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
3HfO2High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
4HfO2Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
5HfO2Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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