Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride|
|2||Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane|
|3||Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition|
|4||The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer|
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