Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||SiNx||Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride|
|2||SiNx||Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane|
|3||SiNx||Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition|
|4||SiNx||The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer|
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: email@example.com
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