TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide, CAS# 19756-04-8

Where to buy

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Tetrakis(dimethylamido)zirconium(IV)
2Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% TDMAZ
4Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ
5Gelest🇺🇸Zirconium Tetrakis(Dimethylamide)
6Ereztech🇺🇸Tetrakis(dimethylamino) zirconium
7Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml cylinder (96-1070) for CVD/ALD
8DOCK/CHEMICALS🇩🇪Tetrakis(dimethylamido)zirconium

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 37 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
2Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
3Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
4Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
5In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
6Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
7Lithium-Iron (III) Fluoride Battery with Double Surface Protection
8Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
9Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
10Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
11Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
12Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
13Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
14Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
15Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
16Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
17Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
18Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
19Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
20Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
21Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
22Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
23Single-Cell Photonic Nanocavity Probes
24Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
25Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
26Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
27Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
28Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
29Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
30In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
31ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
32The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
33Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
34Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
35Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
36Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
37Sub-7-nm textured ZrO2 with giant ferroelectricity