Tris(IsoPropylCycloPentaDienyl)Lanthanum, (iPrCp)3La, CAS# 68959-87-5

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NumberVendorLink
1Strem Chemicals, Inc.Tris(i-propylcyclopentadienyl)lanthanum (99.9%-La)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1HfLaOxBand alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
2HfLaOxCharacteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
3HfLaOxComparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
4HfLaOxFerroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
5HfLaOxLow temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
6La2O3Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
7La2O3Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
8La2O3Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
9La2O3Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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