|1||Strem Chemicals, Inc.||Tris(i-propylcyclopentadienyl)lanthanum (99.9%-La)|
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send us an email.
Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||HfLaOx||Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition|
|2||HfLaOx||Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films|
|3||HfLaOx||Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films|
|4||HfLaOx||Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks|
|5||HfLaOx||Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties|
|6||La2O3||Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films|
|7||La2O3||Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition|
|8||La2O3||Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer|
|9||La2O3||Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition|
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: email@example.com
© 2014-2017 plasma-ald.com